Brief: Stay tuned as we highlight the most important features and real-use results of the KF200 In-situ Laser Gas Analyzer. This video showcases how the TDLAS technology enables real-time monitoring of CO, NH₃, HCl, and O₂ in industrial emissions, offering precise and reliable gas detection for harsh environments.
Related Product Features:
Utilizes Tunable Diode Laser Absorption Spectroscopy (TDLAS) for accurate gas concentration measurements.
Features a dual-protection probe design, eliminating the need for positive pressure purging.
Compact and highly reliable structure suitable for harsh industrial environments.
Supports macro-level and trace-level concentration measurements for versatile applications.
High-power lasers without fiber coupling ensure durability in high-dust conditions.
Multiple configurations available, including in-situ probe, bypass, and multi-channel models.
Meets stringent safety standards, including GB7247.1-2001 and IEC 60825-1:1993.
Wide detection range for gases like O₂, CO, NH₃, HCl, and more, with low detection limits.
FAQs:
What gases can the KF200 Laser Gas Analyzer detect?
The KF200 can detect gases such as O₂, CO, NH₃, HCl, CO₂, CH₄, H₂O, and more, with detection limits as low as 0.01% Vol. for O₂ and 0.1 ppm for NH₃.
Is the KF200 suitable for harsh industrial environments?
Yes, the KF200 features a dual-protection probe design and high-power lasers without fiber coupling, making it ideal for high-dust and harsh industrial conditions.
How does the TDLAS technology work in the KF200?
The KF200 uses TDLAS to scan the specific absorption peak of the target gas by modulating the laser wavelength, eliminating background interference and measuring the second harmonic signal for precise concentration calculations.